Patent Assignment Abstract of Title
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Total Assignments:
1
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
17726992
|
Filing Dt:
|
04/22/2022
|
|
Publication #:
|
|
Pub Dt:
|
10/26/2023
| | | | |
|
Inventors:
|
Shihsheng Chang, Andrew Metz, Yun Han, Minjoon Park, Kai-Hung Yu, Eric Chih-Fang Liu
|
|
Title:
|
Method For Improving Etch Rate And Critical Dimension Uniformity When Etching High Aspect Ratio Features Within A Hard Mask Layer
|
|
|
Assignment:
1
|
|
|
|
|
|
|
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
|
|
|
|
|
|
|
|
|
| 3-1 AKASAKA 5-CHOME, MINATO-KU |
| TOKYO, JAPAN 107-6325 |
|
|
|
|
| TEL-EGAN, ENDERS & HUSTON LLP. |
| 1101 S CAPITAL OF TEXAS HWY |
| BLDG. C, SUITE 200 |
| AUSTIN, TX 78746 |
|
|
Search Results as of:
05/13/2024 10:50 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
