Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17738127
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Filing Dt:
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05/06/2022
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Publication #:
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Pub Dt:
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11/09/2023
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Inventor:
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JinYing Lin
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Title:
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Method For Etching High Aspect Ratio Features Within A Dielectric Using A Hard Mask Stack Having Multiple Hard Mask Layers
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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3-1 AKASAKA 5-CHOME, MINATO-KU |
TOKYO, JAPAN 107-6325 |
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TEL-EGAN, ENDERS & HUSTON LLP. |
1101 S. CAPITAL OF TEXAS HIGHWAY |
BLDG. C, SUITE 200 |
AUSTIN, TX 78746 |
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05/13/2024 04:23 AM
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