Patent Assignment Details
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| Reel/Frame: | 003830/0408 | |
| Pages: | 2 |
| | Recorded: | 12/05/1980 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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07/27/1982
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Application #:
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06213526
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Filing Dt:
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12/05/1980
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Title:
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METHOD FOR MAKING AN ELECTRICAL CONTACT TO A SILICON SUBSTRATE THROUGH A RELATIVELY THIN LAYER OF SILICON DIOXIDE ON THE SURFACE OF THE SUBSTRATE
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Assignee
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| A CORP. OF N.Y. |
| ARMONK, NEW YORK 10504 |
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Correspondence name and address
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IBM CORPORATION, PATENT OPERATIONS
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DEPT. 901-BLDG. 300-482
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HOPEWELL JUNCTION, N.Y. 12533
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