Patent Assignment Details
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Reel/Frame: | 006032/0246 | |
| Pages: | 2 |
| | Recorded: | 02/27/1992 | | |
Conveyance: | ASSIGNMENT OF 1/2 OF ASSIGNORS INTEREST |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/21/1993
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Application #:
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07797987
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Filing Dt:
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11/26/1991
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Title:
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METHOD OF FORMING THIN FILM OF AMORPHOUS SILICON BY PLASMA CVD
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Assignees
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NO. 5253, OAZA OKIUBE, UBE CITY |
YAMAGUCHI PREF., JAPAN |
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NO. 1-3-1, KASUMIGASEKI |
CHIYODA-KU, TOKYO, JAPAN |
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Correspondence name and address
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FLEIT, JACOBSON, COHN, PRICE ET AL
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MARTIN FLEIT
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THE JENIFER BUILDING
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400 SEVENTH STREET, N.W.
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WASHINGTON, D.C. 20004
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