Patent Assignment Details
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| Reel/Frame: | 006579/0805 | |
| Pages: | 3 |
| | Recorded: | 06/25/1993 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/20/1996
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Application #:
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08049788
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Filing Dt:
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04/21/1993
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Title:
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EXPOSURE MASK, EXPOSURE MASK SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND METHOD FOR FORMING PATTERN BASED ON EXPOSURE MASK
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Assignee
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| 72, HORIKAWA-CHO |
| SAIWAI-KU, KAWASAKI-SHI, JAPAN 210, |
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Correspondence name and address
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MR. JOHN B. TURNER
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MANAGER, FILING AND PROSECUTION DEPT.
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FINNEGAN, HENDERSON, FARABOW, ET AL.
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1300 I STREET, N.W.
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WASHINGTON, D.C. 20005
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