Patent Assignment Details
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| Reel/Frame: | 007258/0088 | |
| Pages: | 2 |
| | Recorded: | 12/16/1994 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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10/08/1996
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Application #:
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08357403
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Filing Dt:
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12/16/1994
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Title:
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FABRICATION METHOD OF SEMICONDUCTOR DEVICE WITH REFRACTORY METAL SILICIDE FORMATION BY REMOVING NATIVE OXIDE IN HYDROGEN
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Assignee
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| 7-1, SHIBA 5-CHOME, MINATO-KU |
| CORPORATION OF JAPAN |
| TOKYO, JAPAN |
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Correspondence name and address
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OSTROLENK, FABER, GERB & SOFFEN
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EDWARD A. MEILMAN
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1180 AVENUE OF THE AMERICAS
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NEW YORK, NY 10036-8403
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