Patent Assignment Details
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| Reel/Frame: | 008440/0279 | |
| Pages: | 3 |
| | Recorded: | 03/13/1997 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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01/19/1999
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Application #:
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08816676
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Filing Dt:
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03/13/1997
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Title:
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LSI MASK PATTERN EDIT APPARATUS WITH CONTOUR LINE INTENSITY DISTRIBUTION DISPLAY METHOD OF RESOLUTION FOR LITHOGRAPHY
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Assignee
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| 72 HORIKAWA-CHO, SAIWAI-KU |
| KAWASAKI-SHI, JAPAN |
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Correspondence name and address
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OBLON, SPIVAK, MCCLELLAND, ET AL
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MARVIN J. SPIVAK
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FOURTH FLOOR
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1755 JEFFERSON DAVIS HIGHWAY
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ARLINGTON, VA 22202
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