Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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Reel/Frame: | 009520/0314 | |
| Pages: | 5 |
| | Recorded: | 07/29/1998 | | |
Conveyance: | (ASSIGNMENT OF ASSIGNOR'S INTEREST) RE-RECORD TO CORRECT THE RECORDATION DATE OF 07-28-98 TO 07-29-98 PREVIOUSLY RECORDED AT REEL 9352, FRAME 0854. |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/19/2000
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Application #:
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09062832
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Filing Dt:
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04/20/1998
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Title:
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METHOD OF DEVELOPING A PHOTORESIST PATTERN AND A DEVELOPING APPARATUS
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Assignee
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72, HORIKAWA-CHO, SAIWAI-KU |
KAWASAKI-SHI, KANAGAWA-KEN, JAPAN |
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Correspondence name and address
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OBLON SPIVAK MCCLELLAND MAIER & NEUSTADT
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ATTORNEYS AT LAW
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NORMAN F. OBLON
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1755 JEFFERSON DAVIS HIGHWAY, 4TH FLOOR
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ARLINGTON, VIRGINIA 22202
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