Patent Assignment Details
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Reel/Frame: | 010020/0045 | |
| Pages: | 2 |
| | Recorded: | 05/28/1999 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/21/2001
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Application #:
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09321567
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Filing Dt:
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05/28/1999
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Title:
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PRODUCTION METHOD FOR SILICON EPITAXIAL WAFER
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Assignee
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CHIYODA-KU |
4-2 MARUNOUCHI, 1-CHOME |
TOKYO, JAPAN |
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Correspondence name and address
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SNIDER & CHAO, LLP
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RONALD R. SNIDER
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P.O. BOX 27613
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WASHINGTON, D.C. 20038-7613
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