Patent Assignment Details
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| Reel/Frame: | 011401/0279 | |
| Pages: | 2 |
| | Recorded: | 12/21/2000 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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02/11/2003
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Application #:
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09741375
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Filing Dt:
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12/21/2000
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Publication #:
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Pub Dt:
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06/28/2001
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Title:
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MASK SET FOR USE IN PHASE SHIFT PHOTOLITHOGRAPHY TECHNIQUE WHICH IS SUITABLE TO FORM RANDOM PATTERNS, AND METHOD OF EXPOSURE PROCESS USING THE SAME
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Assignee
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| 7-1, SHIBA 5-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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YOUNG & THOMPSON
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RHONDA DESPER
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745 SOUTH 23RD STREET
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SECOND FLOOR
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ARLINGTON, VA 22202
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