Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 014078/0026 | |
| Pages: | 4 |
| | Recorded: | 10/27/2003 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
9
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Patent #:
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Issue Dt:
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07/27/1999
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Application #:
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08871245
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Filing Dt:
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06/09/1997
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Title:
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METHOD FOR THE PREPARTION OF COPOLYMERS OF ETHYLENE/NORBORNENE-TYPE MONOMERS WITH NICKEL CATALYSTS
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Patent #:
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Issue Dt:
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11/14/2000
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Application #:
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09253497
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Filing Dt:
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02/19/1999
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Title:
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POLYCYCLIC RESIST COMPOSITIONS WITH INCREASED ETCH RESISTANCE
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Patent #:
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Issue Dt:
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09/17/2002
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Application #:
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09253499
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Filing Dt:
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02/19/1999
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Title:
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MODIFIED POLYCYCLIC POLYMERS
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Patent #:
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Issue Dt:
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03/06/2001
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Application #:
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09305942
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Filing Dt:
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05/06/1999
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Title:
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METHOD FOR THE PREPARATION OF COPOLYMERS OF ETHYLENE/NORBORNENE-TYPE MONOMERS WITH NICKEL CATALYSTS
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Patent #:
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Issue Dt:
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07/16/2002
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Application #:
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09497846
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Filing Dt:
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02/03/2000
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Title:
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NORBORNENE SULFONAMIDE POLYMERS
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Patent #:
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Issue Dt:
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02/25/2003
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Application #:
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09521351
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Filing Dt:
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03/09/2000
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Title:
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POLYCYCLIC POLYMERS CONTAINING PENDANT CYCLIC ANTHYDRIDE GROUPS
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Patent #:
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Issue Dt:
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09/17/2002
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Application #:
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09604749
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Filing Dt:
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06/27/2000
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Title:
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POLYCYCLIC RESIST COMPOSITIONS WITH INCREASED ETCH RESISTANCE
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Patent #:
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Issue Dt:
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04/20/2004
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Application #:
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09850915
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Filing Dt:
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05/08/2001
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Publication #:
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Pub Dt:
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09/12/2002
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Title:
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PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS
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Patent #:
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Issue Dt:
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09/21/2004
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Application #:
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10224994
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Filing Dt:
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08/21/2002
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Publication #:
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Pub Dt:
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01/23/2003
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Title:
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MODIFIED POLYCYCLIC POLYMERS
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Assignee
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| 5-8 HIGASHI-SHINAGAWA 2-CHOME |
| SHINAGAWA-KU |
| TOKYO 140-0002, JAPAN |
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Correspondence name and address
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HUDAK SHUNK & FARINE CO. L.P.A.
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NESTOR W. SHUST
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2020 FRONT STREET
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SUITE 307
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CUYAHOGA FALLS, OH 44221
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