Patent Assignment Details
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| Reel/Frame: | 014171/0691 | |
| Pages: | 6 |
| | Recorded: | 06/10/2003 | | |
| Conveyance: | CORRECTIVE ASSIGNMENT TO CORRECT THE SECOND ASSIGNEE ADDRESS, PREVIOUSLY RECORDED AT REEL 013629, FRAME 0558. |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10334992
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Filing Dt:
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01/02/2003
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Publication #:
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Pub Dt:
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01/29/2004
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Title:
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METHOD OF FORMING RESIST PATTERN, REMOVING RESIST DEFECTS, AND MANUFACTURING A SEMICONDUCTOR DEVICE
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Assignees
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| 2-3, MARUNOUCHI 2-CHOME |
| CHIYODA-KU, TOKYO, JAPAN 100-8310 |
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| 4-1, MIZUHARA |
| ITAMI-SHI, HYOGO, JAPAN 664-0005 |
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Correspondence name and address
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LEYDIG, VOIT & MAYER
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JEFFREY A. WYAND
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700 THIRTEENTH STREET, N.W.
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SUITE 300
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WASHINGTON, D.C. 20005-3960
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