Patent Assignment Details
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Reel/Frame: | 014189/0770 | |
| Pages: | 2 |
| | Recorded: | 02/26/2003 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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07/26/2005
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Application #:
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10362855
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Filing Dt:
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02/26/2003
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Publication #:
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Pub Dt:
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10/09/2003
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Title:
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POSITIVE RESIST COMPOSITION OF CHEMICAL AMPLIFICATION TYPE, RESIST COATED MATERIAL, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE
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Assignee
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150, NAKAMARUKO |
NAKAHARA-KU, KAWASAKI-SHI |
KANAGAWA-KEN, JAPAN |
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Correspondence name and address
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HOFFMAN & BARON LLP
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CHARLES R. HOFFMAN
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6900 JERICHO TURNPIKE
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SYOSSET, NY 11791
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