Patent Assignment Details
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| Reel/Frame: | 015177/0508 | |
| Pages: | 2 |
| | Recorded: | 04/06/2004 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/12/2003
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Application #:
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09782283
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Filing Dt:
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02/14/2001
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Publication #:
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Pub Dt:
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03/07/2002
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Title:
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METHOD FOR FORMATION OF SEMICONDUCTOR DEVICE PATTERN, METHOD FOR DESIGNING PHOTO MASK PATTERN, PHOTO MASK AND PROCESS FOR PHOTO MASK
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Assignee
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| 4-1, MARUNOUCHI 2-CHOME, |
| CHIYODA-KU |
| TOKYO 100-6334, JAPAN |
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Correspondence name and address
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MCDERMOTT, WILL & EMERY
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STEPHEN A. BECKER
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600 13TH STREET, N.W.
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WASHINGTON, DC 20005-3096
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