Patent Assignment Details
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| Reel/Frame: | 015587/0786 | |
| Pages: | 2 |
| | Recorded: | 07/20/2004 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10843673
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Filing Dt:
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05/12/2004
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Publication #:
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Pub Dt:
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11/18/2004
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Title:
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Exposure mask pattern formation method, exposure mask, and semiconductor device production method employing the exposure mask
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Assignee
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| 22-22, NAGAIKE-CHO, ABENO-KU |
| OSAKA-SHI, OSAKA 545-8522, JAPAN |
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Correspondence name and address
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NIXON & VANDERHYE P.C.
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H. WARREN BURNAM, JR.
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1100 NORTH GLEBE ROAD
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8TH FLOOR
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ARLINGTON, VA 22201
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