Patent Assignment Details
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Reel/Frame: | 018503/0980 | |
| Pages: | 4 |
| | Recorded: | 10/25/2006 | | |
Attorney Dkt #: | 1608-8 PCT/US |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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12/07/2010
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Application #:
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11587509
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Filing Dt:
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07/23/2007
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Publication #:
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Pub Dt:
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02/07/2008
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Title:
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MATERIAL FOR FORMING RESIST PROTECTIVE FILM FOR USE IN LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHOD FOR FORMING RESIST PATTERN USING THE PROTECTIVE FILM
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Assignee
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150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
KANAGAWA, JAPAN 211-0012 |
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Correspondence name and address
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DANIEL A. SCOLA, JR.
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HOFFMANN & BARON,LLP
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6900 JERICHO TURNPIKE
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SYOSSET, NY 11791
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