Patent Assignment Details
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| Reel/Frame: | 019165/0101 | |
| Pages: | 3 |
| | Recorded: | 04/05/2007 | | |
| Attorney Dkt #: | 04329.4091 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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11/04/2008
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Application #:
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11653279
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Filing Dt:
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01/16/2007
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Publication #:
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Pub Dt:
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08/09/2007
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Title:
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PROJECTION EXPOSURE MASK ACCEPTANCE DECISION SYSTEM, PROJECTION EXPOSURE MASK ACCEPTANCE DECISION METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND COMPUTER PROGRAM PRODUCT
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Assignee
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| 1-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO 105-8001, JAPAN |
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Correspondence name and address
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FINNEGAN, HENDERSON, FARABOW, GARRETT &
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LLP
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901 NEW YORK AVENUE, NW
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WASHINGTON, DC 20001-4413
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