Patent Assignment Details
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| Reel/Frame: | 024730/0763 | |
| Pages: | 3 |
| | Recorded: | 07/23/2010 | | |
| Attorney Dkt #: | 4991-0159PUS1 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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12/23/2014
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Application #:
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12821850
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Filing Dt:
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06/23/2010
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Publication #:
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Pub Dt:
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12/30/2010
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Title:
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CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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Assignee
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| 27-1, SHINKAWA 2-CHOME, CHUO-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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BIRCH, STEWART, KOLASCH & BIRCH, LLP
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P.O. BOX 747
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FALLS CHURCH, VA 22040-0747
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