Patent Assignment Details
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| Reel/Frame: | 030761/0156 | |
| Pages: | 2 |
| | Recorded: | 07/09/2013 | | |
| Attorney Dkt #: | 418675US99 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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06/09/2015
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Application #:
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13937771
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Filing Dt:
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07/09/2013
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Publication #:
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Pub Dt:
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01/16/2014
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Title:
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REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODUCTION, AS WELL AS SUBSTRATE WITH REFLECTIVE LAYER FOR SUCH MASK BLANK AND PROCESS FOR ITS PRODUCTION
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Assignee
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| 5-1, MARUNOUCHI 1-CHOME |
| CHIYODA-KU, TOKYO, JAPAN 100-8405 |
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Correspondence name and address
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OBLON, SPIVAK, ET AL.
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1940 DUKE STREET
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ALEXANDRIA, VA 22314
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