Patent Assignment Details
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| Reel/Frame: | 033666/0529 | |
| Pages: | 2 |
| | Recorded: | 09/04/2014 | | |
| Attorney Dkt #: | TR-US145254 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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03/08/2016
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Application #:
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14382823
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Filing Dt:
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09/04/2014
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Publication #:
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Pub Dt:
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03/12/2015
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Title:
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CHEMICAL VAPOR DEPOSITED FILM FORMED BY PLASMA CVD METHOD
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Assignee
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| NIHONBASHI MUROMACHI BLDG., 3-16, |
| NIHONBASHI HONGOKUCHO 3-CHOME |
| CHUO-KU, TOKYO, JAPAN 103-0021 |
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Correspondence name and address
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GLOBAL IP COUNSELORS, LLP DAVID TARNOFF
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1233 20TH STREET, NW, SUITE 700
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SUITE 700
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WASHINGTON, DC 20036-2680
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