Patent Assignment Details
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| Reel/Frame: | 035893/0445 | |
| Pages: | 4 |
| | Recorded: | 06/24/2015 | | |
| Attorney Dkt #: | 20374-136512-US |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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06/18/2019
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Application #:
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14655087
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Filing Dt:
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06/24/2015
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Publication #:
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Pub Dt:
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11/12/2015
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Title:
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PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, AND METHOD FOR FORMING RESIST PATTERN
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Assignee
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| 9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, |
| TOKYO, JAPAN 100-6606 |
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Correspondence name and address
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FITCH, EVEN, TABIN & FLANNERY, LLP
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120 SOUTH LASALLE STREET, SUITE 1600
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CHICAGO, IL 60603-3406
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