Patent Assignment Details
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Reel/Frame: | 038100/0640 | |
| Pages: | 4 |
| | Recorded: | 03/25/2016 | | |
Attorney Dkt #: | Q225720 |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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06/18/2019
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Application #:
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15080714
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Filing Dt:
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03/25/2016
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Publication #:
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Pub Dt:
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07/21/2016
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Title:
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ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND
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Assignee
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26-30, NISHIAZABU 2-CHOME, MINATO-KU |
TOKYO, JAPAN 106-8620 |
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Correspondence name and address
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SUGHRUE MION PLLC
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2100 PENNSYLVANIA AVE NW
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SUITE 800
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WASHINGTON, DC 20037
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