Patent Assignment Details
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| Reel/Frame: | 041124/0422 | |
| Pages: | 5 |
| | Recorded: | 01/30/2017 | | |
| Attorney Dkt #: | Q224788 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/01/2017
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Application #:
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14908955
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Filing Dt:
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01/29/2016
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Publication #:
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Pub Dt:
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07/14/2016
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Title:
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SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
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Assignee
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| 7-5, NAKA-OCHIAI 2-CHOME |
| SHINJUKU-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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SUGHRUE MION, PLLC
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2100 PENNSYLVANIA AVENUE, NW
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SUITE 800
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WASHINGTON, DC 20037
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