Patent Assignment Details
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| Reel/Frame: | 044433/0901 | |
| Pages: | 8 |
| | Recorded: | 12/19/2017 | | |
| Attorney Dkt #: | 20277-141446-US |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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15550207
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Filing Dt:
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08/10/2017
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Publication #:
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Pub Dt:
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02/01/2018
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Title:
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COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN
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Assignee
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| 5-2, MARUNOUCHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8324 |
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Correspondence name and address
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FITCH EVEN TABIN & FLANNERY, LLP
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120 SOUTH LASALLE STREET
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SUITE 1600
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CHICAGO, IL 60603-3406
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