Patent Assignment Details
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| Reel/Frame: | 056679/0120 | |
| Pages: | 5 |
| | Recorded: | 06/26/2021 | | |
| Attorney Dkt #: | 14296.0042-00000 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17197978
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Filing Dt:
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03/10/2021
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Publication #:
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Pub Dt:
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11/04/2021
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Title:
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PATTERN FORMING METHOD, PHOTOMASK SUBSTRATE CREATION METHOD, PHOTOMASK CREATION METHOD, AND PHOTOMASK
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Assignee
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| 1-21, SHIBAURA 3-CHOME, MINATO-KU |
| TOKYO, JAPAN 108-0023 |
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Correspondence name and address
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FINNEGAN, HENDERSON, FARABOW, GARRETT & DUNNER
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901 NEW YORK AVENUE, NW
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WASHINGTON, DC 22191
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